The Central industrial Security Force has identified 160 vulnerable points at Metro stations in the national capital that have glass partitions of very low height between secured and non-secured areas of the stations from where dangerous articles can be passed inside the premises. To secure these points, the CISF is planning to deploy queue manager system.
The CISF, responsible for securing the Delhi Metro, claimed that glass partitions of very low height are a major security concern. Identification of these spots were taken up by the CISF after a man killed himself inside the busy Rajiv Chowk Metro station on October 2 by using a firearm which he managed to smuggle inside by taking the advantage of the of the low glass partition.
CISF director-general Surender Singh on Tuesday said that the glass partitions are the weakest links in the Delhi Metro. “At least 160 weak points have been zeroed in on the Delhi Metro network. We are trying to manage it with the queue manager system. The CISF has also taken several other measures to avoid any unprecedented incidents inside the Metro through this structural problem,” added Mr Singh.
After the concern was shared with the Delhi Metro Rail Corporation, the heights of some partitions have been raised. “The DMRC has increased the height of the glass partitions at 14 places, which were not more than three-and-a-half feet at other locations,” said CISF director-general.
Meanwhile, sources said the CISF is keeping a strict watch at all these 160 weak points with the deployment of an armed security personnel behind a bulletproof structure at each place with the additional queue manager system and CCTV.
A senior CISF official said that around 100 people were caught in 2015 for passing some materials, bags and laptops to their fellow passengers over the glass partition. “Most of the passengers were unaware that passing materials without clearing from the X-Ray baggage machines is a punishable offence. Around 90 violators were fined between Rs 200-Rs 250 for their offence,” he added.
